Planning

Monday, November 28, 2022 ›
08:00
09:00
10:00
11:00
12:00
13:00
14:00
15:00
16:00
17:00
18:00
›8:30 (50min)
Lithography I (UV lithography, direct writing, masks)
Guillaume Jutzi, FEMTO-ST
› Amphi JJ Gagnepain, FEMTO-ST
›9:20 (50min)
Lithography II (two photon lithography): MPO 100, a multi-user tool for 3D lithography and 3D microprinting
S. Kohlhaas, Heidelberg Instruments / Multiphoton Optics
› Amphi JJ Gagnepain, FEMTO-ST
›10:10 (20min)
Coffee break
›10:30 (50min)
Wet etching and RIE
Djaffar Belharet, FEMTO-ST
› Amphi JJ Gagnepain, FEMTO-ST
›11:20 (50min)
Microstructuring of glass (wet and dry etching, direct and assited femtosecond laser processing, micromolding)
Sylwester Bargiel, FEMTO-ST
› Amphi JJ Gagnepain, FEMTO-ST
›12:10 (1h20)
Lunch
›13:30 (30min)
Introduction to the clean room environment
Samuel Queste, FEMTO-ST
› Amphi JJ Gagnepain, FEMTO-ST
›14:00 (2h)
Demonstration I
› Cleanroom MIMENTO
›16:00 (2h)
Demonstration II
› Cleanroom MIMENTO
Session
Speech
Logistics
Break
Tour
Loading... Loading...